Nanofabrication of Diamond-like Carbon Templates for Nanoimprint Lithography
نویسندگان
چکیده
منابع مشابه
Nanofabrication of Diamond-like Carbon Templates for Nanoimprint Lithography
Diamond like carbon (DLC) films were deposited on Si and then patterned to form 40 nm features as nanoimprint templates. A plasma enhanced chemical vapor deposition (PECVD) system with CH4 precursor was used to deposit DLC films on Si and quartz substrates. These films were then characterized using Raman spectroscopy, atomic force microscopy (AFM), nanoindentation, and contact angle measurement...
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The interaction between resist and template during the separation process after nanoimprint lithography (NIL) can cause the formation of defects and damage to the templates and resist patterns. To alleviate these problems, fluorinated self-assembled monolayers (F-SAMs, i.e. tridecafluoro-1,1,2,2,tetrahydrooctyl trichlorosilane or FDTS) have been employed as template release coatings. However, w...
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Copyright Statement Copyright 2006 Society of Photo-Optical Instrumentation Engineers. This paper was published in SPIE volume 6037: Device and Process Technologies for Microelectonics, MEMS, and Photonics IV and is made available as an electronic reprint with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to...
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Nowadays, nanodevices like small fluidic channels, semiconductor lasers, nano contacts for solar cells, nano magnets or nano antennas for infrared detection (THz) are of great interest. The applications for these devices extend the fields of e.g. energy, computational or medical sciences. For example, by arranging nano dots consisting of a magnetic material, logical circuits can be designed whi...
متن کاملNanoimprint Lithography
The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the...
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ژورنال
عنوان ژورنال: MRS Proceedings
سال: 2006
ISSN: 0272-9172,1946-4274
DOI: 10.1557/proc-0956-j13-04